{"id":151,"date":"2017-05-02T14:33:30","date_gmt":"2017-05-02T18:33:30","guid":{"rendered":"https:\/\/carleton.ca\/barrylab\/?page_id=151"},"modified":"2026-04-15T11:45:07","modified_gmt":"2026-04-15T15:45:07","slug":"publications","status":"publish","type":"page","link":"https:\/\/carleton.ca\/barrylab\/publications\/","title":{"rendered":"Publications and Patents"},"content":{"rendered":"

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Chemistry of ALD – A Textbook<\/h3>\n

You can buy it here<\/a>,<\/p>\n

\"\"\u00a0and the Amazon author page can be found here<\/a>.<\/p>\n

I hope it will be the backbone of a course on ALD chemistry; it isn\u2019t comprehensive concerning precursors or surface chemistry, but rather, it will go through the core concepts of understanding ALD from a chemistry point of view.<\/td>\n<\/tr>\n

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<\/h3>\n<\/td>\n<\/tr>\n

\"\"<\/a><\/td>\n\"\"<\/a><\/td>\n\"\"<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

\u00a0<\/strong><\/h2>\n

2026<\/strong><\/h2>\n\n\n\n\n
112<\/strong>. An, K.; Lawford, K. G.; Gu, B.; Patil, A. H.; Rogers, A. D.; Barry, S. T.; Lee, H.-B.-R. Atomic Layer Deposition of Molybdenum Carbide and Substrate-dependent Reduction to Metallic Molybdenum.\u00a0J. Mater. Chem. C<\/em> 2026<\/strong>\u00a0<\/em>ASAP<\/em>.
\nDOI: 10.1039\/D6TC00454G<\/a><\/td>\n<\/tr>\n
111<\/strong>. \u00a0Goodwin, E. R.; Barry, S. T. Surface ligand decomposition for practical applications<\/span>. Encycl. Interfacial Chem.<\/em> 2026<\/strong>\u00a0in press<\/i>.
\nDOI: 10.1016\/B978-0-443-27509-8.00007-3<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2025<\/strong><\/h2>\n\n\n\n\n\n\n\n
110<\/strong>. \u00a0Bakiro, M. Y.; Lomax, J. T.; Nguyen, J.; Alonso, M. P.; Parsons, G. N.; Barry, S. T. Molecular Layer Deposition of an Aluminum Formate Metal\u2212Organic Framework for Selective Carbon Dioxide Capture.\u00a0Chem. Mater.<\/em>\u00a02025<\/strong>\u00a037<\/em>, 9451\u20139459.
\nDOI:\u00a010.1021\/acs.chemmater.5c02016<\/a><\/td>\n<\/tr>\n
P7<\/strong>. Crudden, C. M.; Barry, S. T.; Goodwin, E. R.; Ragogna, P. J.; Lomax, J. T.; Hedberg, Y.; Yang, M. S.; Senanayake, W.; Auzeroll, J.; Laundry-Mottiar, L.; Suduwella, T. M. Carbene-Functionalized Composite Materials.\u00a0Patent Application\u00a0<\/em>2025<\/strong>.
\nNo.: US 12,409,473 B2<\/td>\n<\/tr>\n
109<\/strong>. Goodwin, E.; Bentley, J. N.; Bakiro, M.; Aloisio, M. D.; Lomax, J. T.; Singh, I.; Veinot, A. J.; Nezamzedah, A.; Ragogna, P. J.; Crudden, C. M.; Barry, S. T. Benzimidazolium Hydrogen Carbonate Salts \u2013 Investigation of Thermal Properties in the Context of Small Molecule Inhibitors.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2025<\/strong>\u00a043<\/em>, 062403.
\n<\/em>DOI:\u00a010.1116\/6.0004886<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2025-d12p7<\/a><\/td>\n<\/tr>\n
108<\/strong>. Goodwin, E.; Davies, M.; Bakiro, M.; Desroche, E.; Tumino, F.; Aloisio, M. D.; Crudden, C. M.; Ragogna, P. J.; Karttunen, M.; Barry, S. T. Atomic Layer Restructuring of Gold Surfaces by N-Heterocyclic Carbenes over Large Surface Areas.\u00a0ACS Nano<\/em>\u00a02025\u00a0<\/strong>19<\/em>, 15617\u201315626.
\nDOI:\u00a010.1021\/acsnano.4c17517<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2024-fsb28<\/a><\/td>\n<\/tr>\n
107<\/strong>. Meng, X.; Elam J. W.; Barry, S. T. Editorial for Focus on Emerging Processes and Applications of Atomic and Molecular Layer Deposition.\u00a0Nanotechnology<\/em>\u00a02025<\/strong>\u00a036, 090201.
\nDOI:\u00a010.1088\/1361-6528\/ad9d4b<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2024<\/strong><\/h2>\n\n\n\n\n\n\n
106<\/strong>. Watanabe, L. K.; Rogers, A. D.; Atherton, M. T.; Lawford, K. G.; Gu, B.; Chun, S.; Lee, S.; Lee, D.; Lee, H.-B.-R.; Barry, S. T. Insights into the Thermal Decomposition Mechanism of Molybdenum(VI) Iminopyridine Adducts.\u00a0Chem. Mater.<\/em>\u00a02024<\/strong>\u00a036<\/em>, 11985\u201311995.<\/em>
\nDOI:\u00a010.1021\/acs.chemmater.4c02689<\/a><\/td>\n<\/tr>\n
105<\/strong>. Land, M. A.; Lawford, K. G.; Watanabe, L. K.; Atherton, M.; Barry, S. T. Put a Ring on It: Improving the Thermal Stability of Molybdenum Imides through Ligand Rigidification.\u00a0Organometallics<\/em>\u00a02024<\/strong>\u00a043<\/em>, 2381\u20132386.
\nDOI:\u00a010.1021\/acs.organomet.4c00084<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2024-9pf8d<\/a><\/td>\n<\/tr>\n
104<\/strong>. Lomax, J. T.; Goodwin, E.; Aloisio, M. D.; Veinot, A. J.; Singh, I.; Shiu, W.-T.; Bakiro, M.; Bentley, J.; DeJesus, J. F.; Gordon, P. G.; Liu, L.; Barry, S. T.; Crudden, C. M.; Ragogna, P. J. Deposition of N-Heterocyclic Carbenes on Reactive Metal Substrates – Applications in Area-Selective Atomic Layer Deposition.\u00a0Chem. Mater.<\/em>\u00a02024<\/strong>\u00a036<\/em>, 5500\u20135507.
\nDOI:\u00a010.1021\/acs.chemmater.4c00412<\/a><\/td>\n<\/tr>\n
103.\u00a0<\/strong>Rowe, C.; Kashyap, A.; Sharma, G.; Goyal, N.; Alauzun, J. G.; Barry, S. T.; Ravishankar, N.; Soni, A.; Eklund, P.; Pedersen, H.; Ramanath, G. Nanomolecularly-induced Effects at Titania\/Organo-Diphosphonate Interfaces for Stable Hybrid Multilayers with Emergent Properties.\u00a0ACS Appl. Nano Mater.<\/em>\u00a02024<\/strong>\u00a07<\/em>, 11225\u201311233.<\/em>
\nDOI:\u00a010.1021\/acsanm.4c00743<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2023<\/strong><\/h2>\n\n\n\n\n\n\n\n\n\n\n
P6<\/strong>. Barry, S. T.; Ba\u010di\u0107, G.; Dezelah, C.; Blanquart, T.; Vervuurt, R. H. J.; Gordon P. G. Vapor deposition processes, reactants and deposition assemblies.\u00a0Patent Application\u00a0<\/em>2023<\/strong>.
\nNo.:\u00a0US18\/190,542<\/a><\/td>\n<\/tr>\n
102<\/strong>. Lawford, K. G.; Land, M. A.; Goodwin, E.; Robertson, K. N.; Barry, S. T. Synthesis, Characterization, and Single-Crystal X\u2011ray Structures of Refractory Metal Compounds as Precursors for the Single-Source Chemical Vapor Deposition of Metal Nitrides.\u00a0Inorg. Chem.<\/em>\u00a02023<\/strong>\u00a062<\/em>, 21061\u201321073.
\nDOI:\u00a010.1021\/acs.inorgchem.3c02841<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2023-sq846<\/a><\/td>\n<\/tr>\n
P5.<\/strong>\u00a0Crudden, C. M.; Barry, S. T.; Ragogna, P. J.; Singh, I.; Veinot, A. R.; Goodwin, E. R.; Gordon, P. G.; Zhang, T.; McBreen, P.; Lomax, J. Method of Selective Deposition of Small Molecules on Metal Surfaces.\u00a0Patent Application\u00a0<\/em>2023<\/strong>.
\nNo.:\u00a0US18\/137,538<\/a><\/td>\n<\/tr>\n
101.\u00a0<\/strong>Land, M. A.; Lomax, J. T.; Barry, S. T. Low-Temperature, Single-Source, Chemical Vapor Deposition of Molybdenum Nitride Thin Films.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2023<\/strong>\u00a041<\/em>, 053403.
\nDOI:\u00a010.1116\/6.0002830<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2023-f5gck<\/a><\/td>\n<\/tr>\n
100.<\/strong>\u00a0Land, M. A.; Robertson, K. N.; Cyburne, J.; Barry, S. T. Disturbance of Intermolecular Forces: Eutectics as a New Tool for the Preparation of Vapor-Phase Deposition Precursors.\u00a0Phys. Chem. Chem. Phys.<\/em>\u00a02023\u00a0<\/strong>25<\/em>, 8336-8340.
\nDOI:\u00a010.1039\/D2CP05341A<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2022-g0bg9<\/a><\/td>\n<\/tr>\n
99<\/strong>. Varga, A. C.; Barry S. T. Reversible alteration of 3D printed polymer properties via infiltration of alumina by atomic layer deposition.\u00a0J. Vac. Sci. Technol. A\u00a0\u00a0<\/i>2023<\/strong>\u00a041<\/em>, 022403.
\nDOI:\u00a010.1116\/6.0002397<\/a><\/td>\n<\/tr>\n
98<\/strong>. Lomax, J. T.; Goodwin, E.; Gordon, P. G.; McGuiness, C.; De Campo, F.; Barry, S. T.; Ragogna, P. J. Plasma-Enhanced Molecular Layer Deposition of Phosphane\u2013Ene Polymer Films.\u00a0Chem. Mater.\u00a0<\/em>2023<\/strong>, 35,<\/em>\u00a01579\u20131585.
\nDOI:\u00a010.1021\/acs.chemmater.2c03036<\/a>
\nPreprint DOI:10.26434\/chemrxiv-2022-20mll<\/a><\/td>\n<\/tr>\n
97<\/strong>. Land, M. A.; Dimova, D.; Robertson, K. N.; Barry, S. T. Cut-and-Pasting Ligands: The Structure\/Function Relationships of a Thermally Robust Mo(VI) Precursor.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2023<\/strong>\u00a041<\/em>, 012403.
\nDOI:10.1116\/6.0002254<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2022-d8gfc<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2022<\/strong><\/h2>\n\n\n\n\n\n\n\n\n\n\n\n
Samii, R.; Fransson, A.; Zanders, D.; Varga, A.; Barry, S. T.; Ojam\u00e4e, L.; Kessler, V.; O’Brien, N. Synthesis, Structure and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition.\u00a0ChemRxiv<\/em>\u00a02022<\/strong>.
\n<\/em>Preprint DOI:\u00a010.26434\/chemrxiv-2022-33s1j<\/a><\/td>\n<\/tr>\n
96.<\/strong>\u00a0Land, M. A.; Ba\u010di\u0107, G.; Robertson, K. N.; Barry, S. T. The Origin of Decomposition in a Family of Molybdenum Precursor Compounds.\u00a0Inorg. Chem.<\/em>\u00a02022<\/strong>\u00a042<\/em>, 16607\u201316621.<\/em>
\n<\/em>DOI:\u00a010.1021\/acs.inorgchem.2c01967<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2022-4gs50<\/a><\/td>\n<\/tr>\n
95.<\/strong>\u00a0Zanders, D.; Masuda, J. D.; Lowe, B.;\u00a0 Curtis, S.; Devi, A.; Barry, S. T. An Unusual Tri-coordinate Co(II) Silylamide with Potential for Chemical Vapor Deposition Processes.\u00a0Z. Anorg. Allg. Chem.<\/em>\u00a02022<\/strong>, e202200249.
\nDOI:\u00a010.1002\/zaac.202200249<\/a><\/td>\n<\/tr>\n
94.<\/strong>\u00a0Popov, G.; Ba\u010di\u0107, G.; Van Dijck, C.; Junkers, L. S.; Wei\u00df, A.; Mattinen, M.; Vihervaara, A.; Chundak, M.; Jalkanen, P.; Mizohata, K.; Leskela, M.; Masuda, J. D.; Barry, S. T.; Ritala, M.; Kemell, M. L. Atomic Layer Deposition of PbCl2<\/sub>, PbBr2<\/sub>\u00a0and mixed lead halide (Cl, Br, I) PbXn<\/sub>Y2-n<\/sub>\u00a0thin films.\u00a0DaltonTrans.<\/em>\u00a02022<\/strong>\u00a051<\/em>, 15142-15157.
\nDOI:\u00a010.1039\/D2DT02216H<\/a><\/td>\n<\/tr>\n
93.<\/strong>\u00a0Wree, J.-L.; Glauber, J.-P.; Zanders, D.; Rogalla, D.; Becher, M.; Griffiths, M. B. E.; Ostendorf, A.; Barry, S. T.; Ney, A.; Devi A. Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films.\u00a0ACS Appl. Electron. Mater.<\/em>\u00a02022<\/strong>\u00a04<\/em>, 3772\u20133779.
\nDOI:\u00a010.1021\/acsaelm.2c00685<\/a><\/td>\n<\/tr>\n
92.<\/strong>\u00a0Veinot, A. J.; Griffiths, M. B. E.; Singh, I.; Zurakowski, J. A.;\u00a0 Lummis, P. A.; Barry, S. T.;\u00a0 Crudden, C. M. Evaluating the thermal behaviour of benzimidazolylidene sources for thin-film applications.\u00a0Mater. Adv.<\/em>\u00a02022<\/strong>\u00a03<\/em>, 6446-6450.
\n<\/em>DOI:\u00a010.1039\/D2MA00413E<\/a><\/td>\n<\/tr>\n
91.<\/strong>\u00a0(Invited) Barry, S. T.; Gordon, P. G.; Vandalon, V. Common Precursors and Surface Mechanisms for Atomic Layer Deposition.\u00a0Comprehensive Organometallic Chemistry IV<\/em>\u00a02022<\/strong>,\u00a014<\/em>, 534-552.
\nDOI:\u00a010.1016\/B978-0-12-820206-7.00117-7<\/a><\/td>\n<\/tr>\n
90.<\/strong>\u00a0Land, M. A.; Ba\u010di\u0107, G.; Robertson, K. N.; Barry, S. T. Thermal Stability and Decomposition Pathways in Volatile Molybdenum(VI) Bis-Imides.\u00a0Inorg. Chem.<\/em>\u00a02022<\/strong>\u00a061<\/em>, 4980\u20134994.
\nDOI:\u00a010.1021\/acs.inorgchem.1c03817<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv-2021-pgfm8<\/a><\/td>\n<\/tr>\n
89.<\/strong>\u00a0Varga, A. C.; Barry, S. T. Modified 3D-Printed Architectures: Effects of Coating by Alumina on ABS.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2022\u00a0<\/strong>40<\/em>, 022407.
\n<\/em>DOI:\u00a010.1116\/6.0001595<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2021<\/strong><\/h2>\n\n\n\n\n\n\n\n\n\n\n\n
P4.\u00a0<\/strong>Barry, S. T.; Wasslen, Y. A. M.; Rahtu, A. H. ALD of metal-containing films using cyclopentadienyl compounds.\u00a0Patent\u00a0<\/i>2021<\/b>.
\nNo.:\u00a08795771<\/a>\u00a0(US)<\/td>\n<\/tr>\n
B1.<\/strong>\u00a0Barry, S. T.; Chemistry of Atomic Layer Deposition, De Gruyter,\u00a02021<\/strong>.
\nWebsite:\u00a0www.degruyter.com<\/a><\/td>\n<\/tr>\n
88.\u00a0<\/strong>Zanders, D.; Boysen, N.; Land, M. A.; Obenl\u00fcneschlo\u00df, J.; Masuda, J. D.; Mallick, B.; Barry, S. T.; Devi, A. Co(II) Amide, Pyrrolate, and Aminopyridinate Complexes: Assessment of their Manifold Structural Chemistry and Thermal Properties\u00a0Eur. J. Inorg. Chem.\u00a0<\/em>2021<\/strong>, p. 5119\u20135136.
\nDOI:\u00a010.1002\/ejic.202100851<\/a>
\nPreprint DOI:\u00a010.33774\/chemrxiv-2021-xf2d1<\/a><\/td>\n<\/tr>\n
87.\u00a0<\/strong>Samii, R.; Zanders, D.; Fransson, A.; Ba\u010di\u0107, G.; Barry, S. T.; Ojam\u00e4e, L.; Kessler, V; Pedersen, H.; O’Brien, N. Synthesis, Characterization and Thermal Study of Divalent Germanium, Tin and Lead Triazenides as Potential Vapor Deposition Precursors.\u00a0Inorg. Chem.<\/i><\/span>\u00a02021<\/strong>\u00a060<\/em>, 12759\u201312765.
\nDOI:\u00a010.1021\/acs.inorgchem.1c00695<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.14176718.v1<\/a><\/td>\n<\/tr>\n
86.\u00a0<\/strong>Pedersen, H.; Barry, S. T.; Sundqvist, J. Green CVD \u2014 Toward a sustainable philosophy for thin film deposition by chemical vapor deposition.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2021\u00a0<\/strong>39,\u00a0<\/em>051001.
\nDOI:\u00a010.1116\/6.0001125<\/a><\/td>\n<\/tr>\n
85.\u00a0<\/strong>Buttera, S.C.; Rouf, P.; Deminskyi, P.; O’Brien, N. J.; Pedersen, H.; Barry, S. T. Resolving Impurities in Atomic Layer Deposited Aluminum Nitride through Low Cost, High-Efficiency Precursor Design.\u00a0Inorg. Chem.\u00a0<\/i>2021<\/strong>\u00a060<\/span><\/em>,\u00a0<\/span>11025\u201311031.<\/span><\/span>
\nDOI:\u00a010.1021\/acs.inorgchem.1c00731<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.13129910.v1<\/a><\/td>\n<\/tr>\n
84.\u00a0<\/strong>Zanders, D.; Liu, J.; Obenl\u00fcneschlo\u00df, J.; Bock, C.; Rogalla, D.; Mai, L.; Nolan, M.; Barry, S. T.; Devi, A. Cobalt Metal ALD: Understanding the Mechanism and Role of Zinc Alkyl Precursors as Reductants for Low Resistivity Co Thin Films.\u00a0Chem. Mater.<\/em>\u00a02021<\/strong>\u00a033<\/em>, 5045\u20135057.
\nDOI:\u00a010.1021\/acs.chemmater.1c00877<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.14206619.v1<\/a><\/td>\n<\/tr>\n
83.\u00a0<\/strong>Griffiths, M. B. E.; Zanders, D.; Land, M. A.; Masuda, J. D.; Devi, A.; Barry, S. T. (t<\/sup>BuN)SiMe2<\/sub>NMe2<\/sub>\u00a0– a new\u00a0N,N’<\/em>–\u03ba2<\/sub><\/em>-monoanionic ligand for atomic layer deposition precursors.\u00a0J. Vac. Sci. Technol. A\u00a0\u00a0<\/i>2021\u00a0<\/strong>39<\/em>, 032409.
\nDOI:\u00a010.1116\/6.0000795<\/a><\/td>\n<\/tr>\n
82.\u00a0<\/strong>Griffiths, M. B. E.; Dubrawski, Z. S.; Gordon, P. G.; Junige, M.; Barry, S. T. Thermal Ranges and Figures of Merit for Gold-Containing Precursors For ALD.J. Vac. Sci. Technol. A\u00a0<\/i>2021\u00a0<\/strong>39<\/em>, 022401.
\nDOI:\u00a010.1116\/6.0000707<\/a>
\n<\/em><\/i>Preprint DOI:\u00a010.26434\/chemrxiv.13077386.v1<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2016 – 2020<\/strong><\/h2>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
81.\u00a0<\/strong>Popov, G.; Ba\u010di\u0107, G.; Mattinen, M.; Manner, M.; Lindstr\u00f6m, H.; Sepp\u00e4nen, H.; Suihkonen, S.; Vehkam\u00e4ki, M.; Kemell, M.; Jalkanen, P.; Mizohata, K.; R\u00e4is\u00e4nen, J.; Leskel\u00e4, M.; Koivula, H. M.; Barry, S. T.; Ritala, M. Atomic Layer Deposition of PbS Thin Films at Low Temperatures.\u00a0Chem. Mater.<\/em>\u00a02020<\/strong>\u00a032<\/em>, 8216\u20138228.
\nDOI:\u00a010.1021\/acs.chemmater.0c01887<\/a><\/td>\n<\/tr>\n
80.\u00a0<\/strong>Van Daele, M.; Griffiths, M. B. E.; Minjauw, M. M.; Barry, S. T.; Detavernier, C.; Dendooven, J. Reaction Mechanism of the Me3<\/sub>AuPMe3<\/sub>-H2<\/sub>\u00a0Plasma-Enhanced ALD Process.\u00a0Phys. Chem. Chem. Phys.<\/em>\u00a02020<\/strong>\u00a022<\/em>, 11903-11914.
\nDOI:\u00a010.1039\/C9CP06855D<\/a><\/td>\n<\/tr>\n
79.\u00a0<\/strong>Zanders, D.; Ba\u010di\u0107, G.; Leckie, D.; Odegbesan, O.; Rawson, J. M.; Masuda, J. D.; Devi, A.; Barry, S. T. A Rare Low\u2010Spin Co(IV) Bis(\u03b2\u2010silyldiamide) with High Thermal Stability: Steric Enforcement of a Doublet Configuration.\u00a0Angew. Chem. Int. Ed.<\/em>\u00a02020<\/strong>\u00a059<\/em>, 14138 \u201314142.
\n<\/em>DOI:\u00a010.1002\/anie.202001518<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.11691825.v1<\/a><\/td>\n<\/tr>\n
78.\u00a0<\/strong>(Invited) Land, M. A.; Robertson, K. N.; Barry, S. T. Ligand Assisted Volatilization and Thermal Stability of [(t-BuN=)2<\/sub>MoCl2<\/sub>]2<\/sub>. Organometallics<\/em>\u00a02020<\/strong>\u00a039<\/span><\/em>,\u00a0<\/span>916\u2013927<\/span>.
\nDOI:\u00a010.1021\/acs.organomet.9b00578<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.9413573.v1<\/a><\/td>\n<\/tr>\n
77.\u00a0<\/strong>Hashemi, F. S. M.; Grillo, F.; Ravikumar, V. R.; Benz, D.; Shekhar, A.; Griffiths, M. B. E.; Barry, S. T.; van Ommen, J. R. Thermal Atomic Layer Deposition of Gold Nanoparticles: Controlled Growth and Size Selection for Photocatalysis.\u00a0Nanoscale<\/em>\u00a02020<\/strong>\u00a012<\/em>, 9005-9013.
\n<\/em>DOI:\u00a010.1039\/D0NR01092H<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.10262912.v1<\/a><\/td>\n<\/tr>\n
76.\u00a0<\/strong>Moret, J. L. T. M.; Griffiths, M. B. E.; Frijns, J. E. B. M.; Terpstra, B. E.; Wolterbeek, H. T.;\u00a0 Barry, S. T.; Denkova, A. G.;\u00a0 van Ommen, J. R. Lutetium coating of nanoparticles by atomic layer deposition.\u00a0J. Vac. Sci. Technol. A<\/i>\u00a02020\u00a0<\/strong>38<\/em>, 022414.
\nDOI:\u00a010.1116\/1.5134446<\/a><\/td>\n<\/tr>\n
75.\u00a0<\/strong>Ba\u010di\u0107, G.; Rankine, C. D.; Masuda, J. D.; Wann, D. A.; Barry, S. T. Supramolecular Organization and Evaporation of Polymeric Tin Trifluoroacetates.\u00a0Inorg. Chem.<\/em>\u00a02020<\/strong>\u00a059<\/span><\/em>, 996\u20131005<\/span>.
\nDOI:\u00a010.1021\/acs.inorgchem.9b01308<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.7586459.v1<\/a><\/td>\n<\/tr>\n
74.\u00a0<\/strong>Griffiths, M. B. E.; Dubrawski, Z. S.; Ba\u010di\u0107, G.; Masuda, J. D.; Japanhuge, A.; Zeng, T.; Barry, S. T. Controlling Thermal Stability and Volatility of Organogold(I) Compounds for Vapor Deposition with Complementary Ligand Design. Eur. J. Inorg. Chem.<\/em>\u00a02019<\/strong>\u00a046<\/em>\u00a04927\u20134938.
\nDOI:\u00a010.1002\/ejic.201901087<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.8038973.v2<\/a><\/td>\n<\/tr>\n
73.\u00a0<\/strong>(Invited) Gordon, P. G.; Ba\u010di\u0107, G.; Lopinski, G. P.; Barry, S. T. Workfunction of Al-Doped ZnO films deposited by atomic layer deposition.\u00a0J. Mater. Res.<\/i>\u00a02019<\/strong>\u00a01-6.
\nDOI:\u00a010.1557\/jmr.2019.334<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.5850003.v1<\/a><\/td>\n<\/tr>\n
72.\u00a0<\/strong>Van Daele, M.; Griffiths, M. B. E.; Raza, A.; Minjauw, M. M.; Solano, E.; Feng, J.-Y.; Ramachandran, R. K.; Clemmen, S.; Baets, R.; Barry, S. T.; Detavernier, C.; Dendooven, J. Plasma-Enhanced Atomic Layer Deposition of Nanostructured Gold Near Room Temperature.
\nACS Appl. Mater. Interfaces,\u00a0<\/em>2019<\/strong>\u00a011<\/em>,\u00a037229\u201337238.<\/span>
\nDOI:\u00a010.1021\/acsami.9b10848<\/a><\/td>\n<\/tr>\n
71.\u00a0<\/strong>Guay, J.-M.; Lesina, A. C.; Killaire, G.; Gordon, P. G.; Hahn, C.; Barry, S. T.; Ramunno, L.; Berini, P.; Weck, A.\u00a0Laser-written colours on silver: optical effect of alumina coating.\u00a0Nanophotonics<\/em>\u00a02019<\/strong>\u00a08,<\/em>\u00a0807\u2013822.
\nDOI:\u00a010.1515\/nanoph-2018-0202<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.7364696.v1<\/a><\/td>\n<\/tr>\n
70.\u00a0<\/strong>Chen, B.; Coyle, J. P.; Barry, S. T.; Zaera, F. Rational Design of Metalorganic Complexes for the Deposition of Solid Films: Growth of Metallic Copper with Amidinate Precursors.\u00a0Chem. Mater.\u00a0<\/em>2019<\/strong>, 31<\/em>, 1681\u20131687.
\nDOI:\u00a010.1021\/acs.chemmater.8b05065<\/a><\/td>\n<\/tr>\n
69<\/strong>.\u00a0<\/strong>R\u00f6nnby, K.; Buttera, S. C.; Rouf, P.; Barry, S. T.; Ojam\u00e4e, L.; Pedersen, H. Methylamines as Nitrogen Precursors in Chemical Vapor Deposition of Gallium Nitride.\u00a0J. Phys. Chem. C<\/cite>\u00a02019<\/span><\/strong>,\u00a0123<\/span><\/em>, 6701\u20136710.
\nDOI:\u00a010.1021\/acs.jpcc.9b00482<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.7067687.v1<\/a><\/td>\n<\/tr>\n
Rouf, P.; O\u2019Brien, N. J.; Buttera, S. C.; Barry, S. T.; Pedersen, H.\u00a0Deposition Study of Indium Trisguanidinate as a Possible Indium Nitride Precursor.\u00a0ChemRxiv\u00a0Preprint<\/em>\u00a02018<\/strong>.
\nPreprint DOI:\u00a010.26434\/chemrxiv.7275704.v1<\/a><\/td>\n<\/tr>\n
68.\u00a0<\/strong>Barry, S. T. Group 11 Thin Films by Atomic Layer Deposition.\u00a0Material Matters<\/em>\u00a02018<\/strong>,\u00a013<\/em>(2), 60.
\nLink:\u00a0Material Matters<\/a><\/td>\n<\/tr>\n
67.\u00a0<\/strong>Ritala, M.;\u00a0\u00a0Lee, Buriak, J. M.; Lee, H.-B.-R.; Barry, S. T.\u00a0In Honor of Professor Markku Leskel\u00e4,\u00a0Chem. Mater.<\/em>\u00a02018<\/strong>,\u00a030,<\/em>\u00a04469\u20134474.
\nDOI:\u00a010.1021\/acs.chemmater.8b02742<\/a><\/td>\n<\/tr>\n
66.\u00a0<\/strong>Ba\u010di\u0107*, G.; Zanders, D.; Mallick, B.; Devi, A.; Barry, S. T.\u00a0Designing Stability into Thermally Reactive Plumbylenes.\u00a0Inorg. Chem.<\/em>\u00a02018<\/strong>\u00a057,<\/em>\u00a08218 \u2013 8226.
\nDOI:\u00a010.1021\/acs.inorgchem.8b00719<\/a>
\nPreprint DOI:\u00a010.26434\/chemrxiv.5972863.v1<\/a><\/td>\n<\/tr>\n
65.\u00a0<\/strong>Barry, S. T.\u00a0Chemists, It Is Time To Embrace Preprints.\u00a0Chem. Mater.<\/em>\u00a02018<\/strong>,\u00a030<\/em>,\u00a02859 \u2013 2859.
\nDOI:\u00a010.1021\/acs.chemmater.8b01360<\/a><\/td>\n<\/tr>\n
64.\u00a0<\/strong>Guay, J.-M.; Killaire, G.; Gordon, P. G.; Barry, S. T.; Berini, P.; Weck, A. Passivation of plasmonic colors on bulk silver by atomic\u00a0layer deposition of aluminum oxide.\u00a0Langmuir<\/em>\u00a02018<\/strong>,\u00a034, 4998 \u2013 5010.
\nDOI:\u00a010.1021\/acs.langmuir.8b00210<\/a><\/td>\n<\/tr>\n
63.\u00a0<\/strong>Barry, S. T.; Teplyakov, A. V.; Zaera, F.\u00a0The chemistry of inorganic precursors during the chemical deposition of films on solid surfaces.\u00a0Acc. Chem. Res.<\/em>\u00a02018<\/strong>,\u00a051<\/span><\/em>, 800 \u2013 809.
\nDOI:\u00a010.1021\/acs.accounts.8b00012<\/a><\/td>\n<\/tr>\n
62.\u00a0<\/strong>Buttera, S. C.; R\u00f6nnby, K.; Pedersen, H.; Ojam\u00e4e, L.; Barry, S. T. Thermal study of an indium trisguanidinate as a possible indium nitride precursor.\u00a0J. Vac. Sci. Technol. A<\/i>\u00a02018\u00a0<\/strong>36<\/em>, 01A101.
\nDOI:\u00a010.1116\/1.5002634<\/a><\/td>\n<\/tr>\n
61.\u00a0<\/strong>Coyle, J. P.; Sirianni, E. R.; Korobkov, I.; Yap, G. P. .; Dey, G.; Barry, S. T.\u00a0Study of Monomeric Copper Complexes Supported by N-Heterocyclic and Acyclic Diamino Carbenes.\u00a0Organometallics<\/em>\u00a02017<\/strong>,\u00a036<\/em>, 2800 \u2013 2810.
\nDOI:\u00a010.1021\/acs.organomet.7b00292<\/a><\/td>\n<\/tr>\n
P3.\u00a0<\/strong>Adermann, T.; Loeffler, D.; Limburg, C.; Abels, F.; Wilmer, H.; Gill, M. A.; Griffiths, M. B. E.; Barry, S. T. Process for the Generation of Thin Inorganic Films,\u00a0Patent Application<\/em>\u00a02016<\/strong>.
\nNo.:\u00a0WO\/2017\/089230<\/a>.<\/td>\n<\/tr>\n
60.\u00a0<\/strong>Guay, J.-M.; CalaLesina, A.; Gordon, P. G.; Baxter, J.; Barry, S. T.; Ramunno, L.; Berini, P.; Weck, A. Plasmonic Coloring of Noble Metals Rendered by Picosecond Laser Exposure.\u00a0Proc. of SPIE\u00a0<\/i>2017<\/b>, 10094.
\n<\/i>DOI:\u00a010.1117\/12.2252302<\/a><\/td>\n<\/tr>\n
59.\u00a0<\/strong>Buttera, S. C.; Mandia, D. J.; Barry, S. T. Tris(dimethylamido)aluminum(III): An Overlooked Atomic Layer Deposition Precursor.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2017<\/b>,\u00a035,\u00a0<\/i>01B128-1 – 01B128-7.
\nDOI:\u00a010.1116\/1.4972469<\/a><\/td>\n<\/tr>\n
58.\u00a0<\/strong>Chen, B.; Duan, Y.; Yao, Y.; Ma; Q.; Coyle, J. P.; Barry, S. T.; Teplyakov, A. V.; Zaera; F. Activation of the Dimers and Tetramers of Metal Amidinate Atomic Layer Deposition Precursors Upon Adsorption on Silicon Oxide Surfaces.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2017<\/b>,\u00a035,\u00a0<\/i>01B124-1 – 01B124-8.
\nDOI:\u00a010.1116\/1.4971990<\/a><\/td>\n<\/tr>\n
57.\u00a0<\/strong>Zhang, W.; Dey, G.; Mandia, D. J.; Barry, S. T. Using a Vapor-Phase Surfactant to Control Gold Metal Plate Growth.\u00a0Adv. Mater. Interfaces\u00a0<\/i>2017<\/b>,\u00a0<\/i>1600864.
\nDOI:\u00a010.1002\/admi.201600864<\/a><\/td>\n<\/tr>\n
56.\u00a0<\/strong>(Invited) Pallister, P. J.; Barry, S. T. Surface Chemistry of Group 11 Atomic Layer Deposition Precursors on Silica using Solid-State Nuclear Magnetic Resonance Spectroscopy.\u00a0J. Chem. Phys.\u00a0<\/i>2017<\/b>,\u00a0146<\/i>, 052812.
\nDOI:\u00a010.1063\/1.4968021<\/a><\/td>\n<\/tr>\n
55.\u00a0<\/strong>Yao, Y.; Coyle, J. P.; Barry, S. T.; Zaera, F. Thermal Decomposition of Copper Iminopyrrolidinate Atomic Layer Deposition (ALD) Precursors on Silicon Oxide Surfaces.\u00a0J. Phys. Chem. C\u00a0<\/i>2016<\/b>,\u00a0120,\u00a0<\/i>14149 – 14156.
\nDOI:\u00a010.1021\/acs.jpcc.6b03818<\/a><\/td>\n<\/tr>\n
54.\u00a0<\/strong>(Invited) Koponen, S. E.; Gordon, P. G.; Barry, S. T. Principles of Precursor Design for Vapour Deposition Methods.\u00a0Polyhedron\u00a0<\/i>2016<\/b>,\u00a0108,\u00a0<\/i>59 \u2013 66.
\nDOI:\u00a010.1016\/j.poly.2015.08.024<\/a><\/td>\n<\/tr>\n
52.\u00a0<\/strong>Griffiths, M. B. E.; Pallister, P. J.; Mandia, D. J; Barry, S. T. Atomic Layer Deposition of Gold Metal.\u00a0Chem. Mater.\u00a0<\/i>2016<\/b>,\u00a028,\u00a0<\/i>44 \u2013 46.
\nDOI:\u00a010.1021\/acs.chemmater.5b04562<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2011 – 2015<\/strong><\/h2>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
51.\u00a0<\/strong>Mandia, D. J.; Zhou, W.; Ward, M. J.; Joress, H.; Sims, J. J.; Giorgi, J. B.; Albert, J.; Barry, S. T. The Effect of ALD-grown Al2<\/sub>O3<\/sub>\u00a0on the Refractive Index Sensitivity of CVD Gold-Coated Optical Fiber Sensors.\u00a0Nanotechnology\u00a0<\/i>2015<\/b>,\u00a026,\u00a0<\/i>434002, 1 \u2013 12.
\nDOI:\u00a010.1088\/0957-4484\/26\/43\/434002<\/a><\/td>\n<\/tr>\n
50.\u00a0<\/strong>Mandia, D. J.; Zhou, W.; Wells, A.; Albert, J.; Barry, S. T. Metallic Nanocoatings on Optical Fibers as a Sensor Platform.\u00a0ECS Trans.<\/i>2015<\/b>,\u00a069,\u00a0<\/i>171 \u2013 179.
\nDOI:\u00a010.1149\/06907.0171ecst<\/span><\/a><\/td>\n<\/tr>\n
49.\u00a0<\/strong>Griffiths, M. B. E.; Koponen, S. E.; Mandia, D. J.; McLeod, J. F.; Coyle, J. P.; Sims, J. J.; Giorgi, J. B.; Sirianni, E. R.; Yap, G. P. A.; Barry, S. T. Surfactant Directed Growth of Gold Metal Nanoplates by Chemical Vapor Deposition.\u00a0Chem. Mater.\u00a0<\/i>2015<\/b>,\u00a027,\u00a0<\/i>6116 \u2013 6124.
\nDOI:\u00a010.1021\/acs.chemmater.5b02712<\/a><\/td>\n<\/tr>\n
48.\u00a0<\/strong>Pallister, P. J.; Buttera, S. C.; Barry, S. T. Self-seeding gallium oxide nanowire growth by pulsed chemical vapour deposition.\u00a0P<\/em>hys. Status Solidi A\u00a0<\/i>2015<\/b>,\u00a0212,\u00a0<\/i>1514 \u2013 1518.
\nDOI:\u00a010.1002\/pssa.201532275<\/a><\/td>\n<\/tr>\n
47.\u00a0<\/strong>Zhou, W.; Mandia, D. J.; Barry, S. T.; Albert, J. Absolute Near-Infrared Refractometry With a Calibrated Tilted Fiber Bragg Grating.\u00a0Opt. Lett.\u00a0<\/i>2015<\/b>,\u00a040,\u00a0<\/i>1713 \u2013 1716.
\nDOI:\u00a010.1364\/OL.40.001713<\/a><\/td>\n<\/tr>\n
46.\u00a0<\/strong>(Invited) Mandia, D. J.; Zhou, W.; Albert, J.; Barry, S. T. Chemical Vapor Deposition on Optical Fibers: Tilted Fiber Bragg Gratings as Real-Time Sensing Platforms.\u00a0Chem. Vap. Deposition\u00a0<\/i>2015<\/b>,\u00a0<\/b>21,\u00a0<\/i>4 \u2013 20.
\nDOI:\u00a010.1002\/cvde.201400059<\/a><\/td>\n<\/tr>\n
45.\u00a0<\/strong>(Invited) Gordon, P. G.; Kurek, A.; Barry, S. T. Trends in Copper Precursor Development for CVD and ALD Applications.\u00a0ECS JSS<\/i>\u00a02015<\/b>,\u00a04,\u00a0<\/i>N3188 \u2013 N3197.
\nDOI:\u00a010.1149\/2.0261501jss<\/span><\/a><\/td>\n<\/tr>\n
44.\u00a0<\/strong>Huynh, K.; Laneman, S. A.; Laxman, R.; Gordon, P. G.; Barry, S. T. New Zr-containing precursors for the atomic layer deposition of ZrO2<\/sub>.\u00a0J. Vac. Sci. Technol. A\u00a0<\/i>2015<\/b>,\u00a033,\u00a0<\/i>013001-1 \u2013 013001-4.
\nDOI:\u00a010.1116\/1.4901454<\/a><\/td>\n<\/tr>\n
43.\u00a0<\/strong>Zhou, W.; Mandia, D. J.; Barry, S. T.; Albert J. Anisotropic Effective Permittivity of an Ultrathin Gold Coating on Optical Fiber in air, water and saline solutions.\u00a0Opt. Express\u00a0<\/i>2014<\/b>,\u00a022,\u00a0<\/i>31665 \u2013 31676.
\nDOI:\u00a010.1364\/OE.22.031665<\/a><\/td>\n<\/tr>\n
42.\u00a0<\/strong>Hagen, D. J.; Povey, I.; Rushworth, S.; Wrench, J. S.; Keeney, L.; Schmidt, M.; Petkov, M.; Barry, S. T.; Coyle J. P.; Pemble, M. E. Atomic Layer Deposition of Cu Using a Carbene-Stabilized Cu (I) Silylamid.\u00a0J. Mater. Chem. C\u00a0<\/i>2014<\/b>,\u00a02,\u00a0<\/i>9205 \u2013 9214.
\nDOI:\u00a010.1039\/C4TC01418A<\/a><\/td>\n<\/tr>\n
41.\u00a0<\/strong>Mandia, D. J.; Zhou, W.; Ward, M. J.; Joress, H.; Giorgi, J. B.; Gordon, P. G.; Albert, J.; Barry, S. T. Chemical Vapor Deposition of Anisotropic Ultrathin Gold Films on Optical Fibers: Real-Time Sensing by Tilted Fiber Bragg Gratings and Use of a Dielectric Pre-Coating.\u00a0Proc. SPIE 9288, Photonics North\u00a0<\/i>2014<\/b>,\u00a0<\/i>92880M-1 \u2013 92880M-10.
\nDOI:\u00a010.1117\/12.2075136<\/a><\/td>\n<\/tr>\n
40.\u00a0<\/strong>(Invited) Kurek, A.; Gordon, P. G.; Karle, S.; Devi, A.; Barry, S. T. Recent Advances Using Guanidinate Ligands for Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) Applications.\u00a0Aust. J. Chem.\u00a0<\/i>2014<\/b>,\u00a067,\u00a0<\/i>989 \u2013 996.
\nDOI:\u00a010.1071\/CH14172<\/a><\/td>\n<\/tr>\n
39.\u00a0<\/strong>Zhou, W.; Mandia, D. J.; Griffiths, M. B. E.; Barry, S. T.; Albert, J. Anomalous refractive index of ultrathin gold nanoparticle film coated on tilted fiber Bragg grating.\u00a0Proc. SPIE 9157, 23rd International Conference on Optical Fibre Sensors\u00a0<\/i>2014<\/b>,\u00a09157,\u00a0<\/i>91573Y-1 \u2013 91573Y-4.
\nDOI:\u00a010.1117\/12.2053091<\/a><\/td>\n<\/tr>\n
38.\u00a0<\/strong>Pallister, P. J.; Buttera, S. C.; Barry, S. T.; Quantitative Surface Coverage Calculations via Solid-State NMR for Thin Film Depositions: A Case Study for Silica and a Gallium Amidinate.\u00a0J. Phys. Chem. C\u00a0<\/i>2014<\/b>,\u00a0118,\u00a0<\/i>1618 \u2013 1627.
\nDOI:\u00a010.1021\/jp4102674<\/a><\/td>\n<\/tr>\n
37.\u00a0<\/strong>Zhou, W.; Mandia, D. J; Griffiths, M. B. E.; Barry, S. T.;\u00a0Albert, J.; Effective Permittivity of Ultrathin Chemical Vapor Deposited Gold Films on Optical Fibers at Infrared Wavelengths.\u00a0J. Phys. Chem. C\u00a0<\/i>2014<\/b>,\u00a0118,\u00a0<\/i>670 \u2013 678.
\nDOI:\u00a010.1021\/jp410937f<\/a><\/td>\n<\/tr>\n
36.\u00a0<\/strong>Coyle, J. P.; Gordon, P. G.; Wells, A. P.; Mandia, D. J.; Sirianni, E. R.; Yap, G. P. A.; Barry, S. T. Thermally Robust Gold and Silver Iminopyrrolidinates for Chemical Vapour Deposition of Metal Films.\u00a0Chem. Mater.\u00a0<\/i>2013<\/b>,\u00a025,\u00a0<\/i>4566\u00a0\u2013 4573.
\nDOI:\u00a010.1021\/cm402658c<\/a><\/td>\n<\/tr>\n
35.\u00a0<\/strong>Kim, T.; Yao, Y.; Coyle, J. P.; Barry, S. T.; Zaera, F. Thermal Chemistry of Cu(I)-Iminopyrrolidinate and Cu(I)-Guanidinate Atomic Layer Deposition (ALD) Precursors on Ni(110) Single-Crystal Surfaces.\u00a0Chem. Mater.\u00a0<\/i>2013<\/b>,\u00a025,\u00a0<\/i>3630\u00a0\u2013 3639.
\nDOI:\u00a010.1021\/cm401707h<\/a><\/td>\n<\/tr>\n
34.\u00a0<\/strong>(Invited) Mandia, D. J.; Griffiths, M. B. E.; Zhou, W.; Gordon, P. G.; Albert, J.; Barry, S. T.\u00a0In Situ Deposition Monitoring by a Tilted Fiber Bragg Grating Optical Probe: Probing Nucleation in Chemical Vapour Deposition of Gold.\u00a0Physics Procedia\u00a0<\/i>2013<\/b>,\u00a046,\u00a0<\/i>12 \u2013 20.
\nDOI:\u00a010.1016\/j.phpro.2013.07.040<\/a><\/td>\n<\/tr>\n
33<\/strong>.\u00a0<\/strong>Coyle, J. P.; Dey, G.; Sirianni, E. R.; Kemell, M. L.; Yap, G. P. A.; Ritala, M.; Leskel\u00e4, M.; Elliott, S. D.; Barry, S. T.\u00a0Deposition of Copper By Plasma-Enhanced Atomic Layer Deposition Using a Novel N-Heterocyclic Carbene Precursor.\u00a0Chem. Mater.\u00a0<\/i>2013<\/b>,\u00a0<\/b>25,\u00a0<\/i>1132\u00a0\u2013 1138.
\nDOI:\u00a010.1021\/cm400215q<\/a><\/td>\n<\/tr>\n
32.\u00a0<\/strong>(Invited) Barry, S. T. Amidinates, Guanidinates and Iminopyrrolidinates: Understanding Precursor Thermolysis to Design a Better Ligand.\u00a0Coord. Chem. Rev.\u00a0<\/i>2013<\/b>,\u00a0<\/b>257,\u00a0<\/i>3192 \u2013 3201.
\nDOI:\u00a010.1016\/j.ccr.2013.03.015<\/a><\/td>\n<\/tr>\n
31.\u00a0<\/strong>Coyle, J. P.; Pallister, P. J.; Kurek, A.; Sirianni, E. R.; Yap, G. P. A.; Barry, S. T. Copper Iminopyrrolidinates: A Study of Thermal and Surface Chemistry.\u00a0Inorg. Chem.\u00a0<\/i>2013<\/strong>, 52,\u00a0<\/i>910 \u2013 917.
\nDOI:\u00a010.1021\/ic3021035<\/a><\/td>\n<\/tr>\n
P2<\/strong>. Barry, S. T.; Coyle, J. P.; Clark, T. J.; Hastie, J. J. M. Group 11 Mono-Metallic Precursor Compounds and Use Thereof in Metal Deposition.\u00a0Patent\u00a0<\/i>2012<\/b>.
\nNo.:\u00a09,453,036<\/a>\u00a0(US)<\/td>\n<\/tr>\n
30.\u00a0<\/strong>Zhou, W.; Mandia, D. J.; Griffiths, M. B. E.; Bialiayeu, A.; Zhang, Y.; Gordon, P. G.; Barry, S. T.; Albert, J.\u00a0Polarization-Dependent Properties of the Cladding Modes of a Single Mode Fiber Covered with Gold Nanoparticles.\u00a0Opt. Express\u00a0<\/i>2013<\/b>,\u00a021,\u00a0<\/i>245 \u2013 255.
\nDOI:\u00a010.1364\/OE.21.000245<\/a><\/td>\n<\/tr>\n
29.\u00a0<\/strong>Coyle, J. P.; Kurek, A.; Pallister, P. J.; Sirianni, E. R.; Yap, G. P. A.; Barry, S. T.\u00a0Preventing Thermolysis: Precursor Design for Volatile Copper Compounds.\u00a0Chem. Commun.\u00a0<\/i>2012<\/b>,\u00a048<\/i>, 10440 \u2013 10442.
\nDOI:\u00a010.1039\/C2CC35415B<\/a><\/td>\n<\/tr>\n
28.\u00a0<\/strong>Gordon, P. G.; Baribeau, R.; Barry, S. T.\u00a0Goniocolorimetric Study of Aluminum Oxide Films Deposited by Atomic Layer Deposition.\u00a0Thin Solid Films<\/i>\u00a02012<\/b>,\u00a0520,\u00a0<\/i>245 \u2013 255.
\nDOI:\u00a010.1016\/j.tsf.2011.10.016<\/a><\/td>\n<\/tr>\n
27.\u00a0<\/strong>Gordon, P. G.; Ward, M. J.; Heikkila, M. J.; Monillas, W. H.; Yap, G. P. A.; Ritala, M.; Leskal\u00e4, M.; Barry, S. T.\u00a0Chemical Vapour Deposition of In2<\/sub>O3<\/sub>\u00a0Thin Films from a tris-Guanidinate Indium Precursor.\u00a0Dalton Trans.\u00a0<\/i>2011<\/b>,\u00a040,\u00a0<\/i>9425 \u2013 9430.
\nDOI:\u00a010.1039\/C1DT10877H<\/a><\/td>\n<\/tr>\n
26.\u00a0<\/strong>Barry, S. T.<\/b>; Kurek, A.\u00a0Metal-Assisted Chemical Etching Using Sputtered Gold: A Simple Route to Black Silicon.\u00a0Sci. Technol. Adv. Mater.\u00a0<\/i>2011<\/b>,\u00a012,\u00a0<\/i>045001-1 \u2013 04500-4.
\nDOI:\u00a010.1088\/1468-6996\/12\/4\/045001<\/a><\/td>\n<\/tr>\n
25.\u00a0<\/strong>Whitehorne, T. J. J.; Coyle, J. P.; Mahmood, A.; Monillas, W. H.; Yap, G. P. A.; Barry, S. T.\u00a0Group 11 Amidinates and Guanidinates: Potential Precursors for Vapour Deposition.\u00a0Eur. J. Inorg. Chem.\u00a0<\/i>2011<\/b>,\u00a0<\/b>21, 3240 \u2013 3247.
\nDOI:\u00a010.1002\/ejic.201100262<\/a><\/td>\n<\/tr>\n
24.\u00a0<\/strong>(Invited) Shao, L.-Y.; Coyle, J. P.; Barry, S. T.; Albert, J.\u00a0Anomalous permittivity and plasmon resonances of copper nanoparticle conformal coatings on optical fibers.\u00a0Opt. Mater. Express\u00a0<\/i>2011<\/b>,\u00a0<\/b>1,\u00a0<\/i>128 \u2013 137.
\nDOI:\u00a010.1364\/OME.1.000128<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

2005 – 2010<\/strong><\/h2>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
23.\u00a0<\/strong>Demtchenko, S.; McGarry, S.; Gordon, P. G.; Barry, S. T.; Tarr, N. G.Characterization and assessment of a novel hybrid organic\/inorganic metal-insulator-semiconductor structure for photovoltaic applications.\u00a0Proc.SPIE\u00a0<\/i>2010<\/b>,\u00a07750<\/em>, 7750-1\u00a0\u2013\u00a0<\/i>7750-9.
\nDOI:\u00a010.1117\/12.871360<\/a><\/td>\n<\/tr>\n
22.\u00a0<\/strong>Wasslen, Y. A.; Kurek, A.; Johnson, P. A.; Pigeon, T. C.; Monillas, W. H.; Yap, G. P. A.; Barry, S. T.\u00a0Heteroleptic Iminopyrrolidinates of Aluminium.\u00a0Dalton Trans.\u00a0<\/i>2010<\/b>,\u00a0<\/b>39,<\/i>\u00a09046 \u2013 9054.
\nDOI:\u00a010.1039\/C0DT00267D<\/a><\/td>\n<\/tr>\n
21.\u00a0<\/strong>Coyle, J. P.; Johnson, P. A.; DiLabio, G. A.; Barry, S. T.; Muller, J.\u00a0Gas-Phase Thermolysis of a Guanidinate Precursor of Copper Studied by Matrix Isolation, Time-of-Flight Mass Spectrometry, and Computational Chemistry\u00a0Inorg. Chem.\u00a0<\/i>2010<\/b>,\u00a0<\/b>49<\/i>, 2844 \u2013 2850.
\nDOI:\u00a010.1021\/ic902247w<\/a><\/td>\n<\/tr>\n
20.\u00a0<\/strong>Wasslen, Y. A.; Tois, E.; Haukka, S.; Kreisel, K. A.; Yap, G. P. A.; Halls, M. D.; Barry, S. T.\u00a0A Family of Heteroleptic Titanium Guanidinates: Synthesis, Thermolysis, and Surface Reactivity.\u00a0Inorg. Chem.\u00a0<\/i>2010<\/b>,\u00a0<\/b>49<\/i>, 1976 \u2013 1982.
\nDOI:\u00a010.1021\/ic902411h<\/a><\/td>\n<\/tr>\n
19.\u00a0<\/strong>Brazeau A. L.; Barry, S. T.\u00a0Atomic Layer Deposition of Aluminum Oxide Thin Films from a Heteroleptic, Amidinate-Containing Precursor.\u00a0Chem. Mater.\u00a0<\/i>2008<\/b>,\u00a0<\/b>20<\/i>, 7287 \u2013 7291.
\nDOI:\u00a010.1021\/cm802195b<\/a><\/td>\n<\/tr>\n
18.\u00a0<\/strong>Dornan, P.; Rowley, C. N.; Priem, J.; Barry, S. T.; Burchell, T. J.; Woo T. K.; Richeson, D. S.\u00a0Atom efficient cyclotrimerization of dimethylcyanamide catalyzed by aluminium amide: a combined experimental and theoretical investigation.\u00a0Chem. Commun.\u00a0<\/i>2008<\/b>, 3645 \u2013 3647.
\nDOI:\u00a010.1039\/B803732A<\/a><\/td>\n<\/tr>\n
17.\u00a0<\/strong>Ziffle, L. C.; Kenney, A. P.; Barry, S. T.; M\u00fcller, J.\u00a0Thermal fragmentation of the guanidinato aluminum amide precursor [Me2NC(NiPr)2]Al(NMe2)2: An investigation of reactive species by matrix-isolation FTIR spectroscopy and time-of-flight mass spectrometry.\u00a0Polyhedron\u00a0<\/i>2008<\/b>,\u00a027<\/i>, 1832 \u2013 1840.
\nDOI:\u00a010.1016\/j.poly.2008.02.024<\/a><\/td>\n<\/tr>\n
16.\u00a0<\/strong>Coyle, J. P.; Monillas, W. H.; Yap, G. P. A.; Barry, S. T.\u00a0Synthesis and Thermal Chemistry of Copper (I) Guanidinates.\u00a0Inorg. Chem.\u00a0<\/i>2008<\/b>,\u00a047<\/i>, 683 \u2013 689.
\nDOI:\u00a010.1021\/ic701317y<\/a><\/td>\n<\/tr>\n
15<\/strong>.\u00a0<\/strong>Brazeau, DiLabio, A. L.; G. A.; Kreisel, K. A.; Monillas, W. H.; Yap, G. P. A.; Barry, S. T.\u00a0Theoretical and experimental investigations of ligand exchange in guanidinate ligand systems for group 13 metals.\u00a0Dalton Trans.\u00a0<\/i>2007<\/strong>,\u00a030<\/i>, 3297 \u2013 3304.
\nDOI:\u00a010.1039\/B706044K<\/a><\/td>\n<\/tr>\n
14.\u00a0<\/strong>Brazeau, A. L.; Wang, Z.; Rowley, C. N.; Barry, S. T.\u00a0Synthesis and Thermolysis of Aluminum Amidinates: A Ligand-Exchange Route for New Mixed-Ligand Systems.\u00a0Inorg. Chem.\u00a0<\/i>2006<\/b>,\u00a0<\/b>45<\/i>, 2276 \u2013\u00a0 2281.
\nDOI:\u00a010.1021\/ic051856d<\/a><\/td>\n<\/tr>\n
13.\u00a0<\/strong>Kenney, A. P.; Yap, G. P. A.; Richeson, D. S.; Barry, S. T.\u00a0 The Insertion of Carbodiimides into Al and Ga Amido Linkages. Guanidinates and Mixed Amido-Guanidinates of Aluminum and Gallium.\u00a0Inorg. Chem.\u00a0<\/i>2005<\/b>,\u00a044<\/i>, 2926 \u2013 2933.
\nDOI:\u00a010.1021\/ic048433g<\/a><\/td>\n<\/tr>\n
12.\u00a0<\/strong>Rowley, C. N.; DiLabio, G. A.; Barry, S. T.\u00a0Theoretical and Synthetic Investigations of Carbodiimide Insertions into Al-CH3<\/sub>and Al-N(CH3<\/sub>)2<\/sub>\u00a0Bonds.\u00a0Inorg. Chem.\u00a0<\/i>2005<\/b>,\u00a0<\/b>44<\/i>, 1983 \u2013 1991.
\nDOI:\u00a010.1021\/ic048501z<\/a><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n

Se\u00e1n’s Post-Docs and PhD (12)<\/h2>\n

11. <\/strong>Li, Z.; Barry, S. T.; Gordon, R. G. Synthesis and Characterization of Copper(I) Amidinates as Precursors for Atomic Layer Deposition (ALD) of Copper Metal.\u00a0Inorg. Chem. <\/i>2005<\/b>, 44<\/i>, 1728 \u2013 1735.
\nDOI: 10.1021\/ic048492u<\/a><\/p>\n

10. <\/strong>Gordon, R. G.; Barry, S. T.; Barton, J. T.; Broomhall-Dillard, R. N. R. Atmospheric pressure chemical vapor deposition of electrochromic tungsten oxide films. Thin Solid Films\u00a0<\/em>2001<\/b>, 392<\/em>, 231 \u2013 235.
\nDOI: 10.1016\/S0040-6090(01)01033-1<\/a><\/p>\n

P1. <\/strong>Gordon, R. G.; Barry, S. T.; Broomhall-Dillard, R. N. R.\u00a0Liquid sources for cvd of group 6 metals and metal compound.\u00a0Patent Application<\/em>\u00a02001<\/strong>.
\nNo.:\u00a0WO2001066816A1<\/a><\/p>\n

9. <\/strong>Gordon, R. G.; Barry, S. T.; Broomhall-Dillard, R. N. R.; Wagner, V. A.; Wang, Y. Volatile liquid precursors for the chemical vapor deposition (CVD) of thin films containing tungsten. MRS Proceedings\u00a0<\/em>2001<\/b>, 612<\/em>,\u00a0D9.12\/1 \u2013 D9.12\/6.
\nDOI:10.1557\/PROC-612-D9.12.1<\/a><\/p>\n

8. <\/strong>Gordon, R. G.; Barry, S. T.; Broomhall-Dillard, R. N. R.; Teff, D. J.\u00a0Synthesis and solution decomposition kinetics of flash-vaporizable liquid barium beta-diketonates. Adv. Mater. Opt. Electron.\u00a0<\/em>2000<\/b>, 10<\/em>, 201 \u2013 211.
\nDOI: 10.1002\/1099-0712(200005\/10)10:3\/5<201::AID-AMO413>3.0.CO;2-O<\/a><\/p>\n

7. <\/strong>Barry, S. T.; Gordon, R. G.; Wagner, V. Monomeric chelated amides of aluminum and gallium: volatile, miscible liquid precursors for CVD. MRS Proceedings\u00a0<\/em>1999<\/strong>, 606<\/em>, 83 \u2013 89.
\nDOI: 10.1557\/PROC-606-83<\/a><\/p>\n

6. <\/strong>Gordon, R. G.; Barry, S. T.; Broomhall-Dillard, R. N. R.; DiCeglie, N., Jr.; Liu, X.; Teff, D. J. Synthesis and decomposition kinetics of liquid precursors for chemical vapor deposition (CVD) of barium. Proceedings – Electrochemical Society<\/em>\u00a01999<\/b>, 98-23<\/em>,\u00a0270 \u2013 279.<\/p>\n

5. <\/strong>Gordon, R. G.; Barry, S. T.; Liu, X.; Teff, D. J. Liquid compounds for CVD of alkaline earth metals. MRS Proceedings<\/em>\u00a01999<\/b>, 574<\/em>,\u00a023 \u2013 30.
\nDOI: 10.1557\/PROC-574-23<\/a><\/p>\n

4. <\/strong>Barry, S. T.; Ruoff, S. A.; Ruoff, A. L. Gallium Nitride Synthesis Using Lithium Metal as a Nitrogen Fixant.Chem. Mater.\u00a0<\/em>1998<\/b>, 10<\/em>, 2571 \u2013 2574.
\nDOI: 10.1021\/cm980021g<\/a><\/p>\n

3. <\/strong>Barry, S. T.; Belhumeur, S.; Richeson, D. S. Thermally-Induced Transformations of Gallium and Indium Alkyl Phosphido Complexes: Dealkylsilylation Routes to MP (M = Ga, In). Organometallics\u00a0<\/em>1997<\/b>, 16<\/em>, 3588 \u2013 3592.
\nDOI: 10.1021\/om9701682<\/a><\/p>\n

2. <\/strong>Barry, S. T.; Richeson, D. S. Preparation and characterization of mixed alkyl amido complexes of gallium. J. Organomet. Chem.<\/em> 1996<\/b>, 510<\/em>, 103 \u2013 108.
\nDOI: 10.1016\/0022-328X(95)05891-R<\/a><\/p>\n

1.<\/strong> Barry, S. T.; Richeson, D. S. Designated molecular deconstruction: the facile transformation of Ga(N(SiMe3<\/sub>)2<\/sub>)(OSiMe3<\/sub>)2<\/sub>py (py = pyridine) to GaN. Chem. Mater.<\/em> 1994<\/b>, 6<\/em>, 2220\u00a0\u2013 2221.
\nDOI:\u00a010.1021\/cm00048a007<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"

Chemistry of ALD – A Textbook You can buy it here, \u00a0and the Amazon author page can be found here. I hope it will be the backbone of a course on ALD chemistry; it isn\u2019t comprehensive concerning precursors or surface chemistry, but rather, it will go through the core concepts of understanding ALD from a […]<\/p>\n","protected":false},"author":4,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"_relevanssi_hide_post":"","_relevanssi_hide_content":"","_relevanssi_pin_for_all":"","_relevanssi_pin_keywords":"","_relevanssi_unpin_keywords":"","_relevanssi_related_keywords":"","_relevanssi_related_include_ids":"","_relevanssi_related_exclude_ids":"","_relevanssi_related_no_append":"","_relevanssi_related_not_related":"","_relevanssi_related_posts":"","_relevanssi_noindex_reason":"","_mi_skip_tracking":false,"_exactmetrics_sitenote_active":false,"_exactmetrics_sitenote_note":"","_exactmetrics_sitenote_category":0,"footnotes":"","_links_to":"","_links_to_target":""},"yoast_head":"\nPublications and Patents - The Barry Lab<\/title>\n<meta name=\"description\" content=\"  Chemistry of ALD - A Textbook You can buy it here, \u00a0and the Amazon author page can be found here. 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