Photo of Picosun PE-ALD

Picosun PE-ALD


Our Picosun R200 Advanced PE-ALD tool is the workhorse of the lab.

Typical substrate size and type

  • 50-200 mm diameter wafers or similarly thin substrates.
  • spacious chamber for 3D objects
  • adapter for deposition on optical fibers

Processing temperature

  • 50 – 450°C

Turnkey processes

  • Al2O3, TiO2, ZnO, AZO, Au metal, Cu metal, laminate combinations
  • many other processes accessible upon request


  • Liquid, solid, gas, ozone, plasma(*)
  • Up to 12 sources with 7 separate inlets

R200 in the cleanroom (drybox-integrated COVAP in the backround)