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Angstrom COVAP

Website:Angstrom Engineering

The Angstrom Covap PVD platform offers a compact, robust solution for many process applications. Deposition sources are isolated to reduce thermal effects and cross contamination.

Integrated into a dedicated MBraun drybox, the COVAP produces repeatable, high quality PVD thin films of elemental materials, compounds, and alloys.

Four sources are available for sequential or co-deposition recipes, with deposition rates calibrated by in-situ quartz crystal microbalances (QCMs).

The tool can accommodate substrate sizes of up to 100 mm in diameter.