The Angstrom Covap PVD platform offers a compact, robust solution for many process applications. Deposition sources are isolated to reduce thermal effects and cross contamination.
Integrated into a dedicated MBraun drybox, the COVAP produces repeatable, high quality PVD thin films of elemental materials, compounds, and alloys.
Four sources are available for sequential or co-deposition recipes, with deposition rates calibrated by in-situ quartz crystal microbalances (QCMs).
The tool can accommodate substrate sizes of up to 100 mm in diameter.