PE-ALD

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Our Picosun R200 Advanced PE-ALD tool is the workhorse of the lab.

Typical substrate size and type

• 50-200 mm diameter wafers or similarly thin substrates.
• spacious chamber for 3D objects
• adapter for deposition on optical fibers

Processing temperature

• 50 – 450°C

Turnkey processes

• Al₂O₃, TiO₂, ZnO, AZO, Au metal, Cu metal, laminate combinations
• many other processes accessible upon request

Precursors

• Liquid, solid, gas, ozone, plasma(*)
• Up to 12 sources with 7 separate inlets