Picosun PE-ALD
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Our Picosun R200 Advanced PE-ALD tool is the workhorse of the lab.
Typical substrate size and type
- 50-200 mm diameter wafers or similarly thin substrates.
- spacious chamber for 3D objects
- adapter for deposition on optical fibers
Processing temperature
- 50 – 450°C
Turnkey processes
- Al2O3, TiO2, ZnO, AZO, Au metal, Cu metal, laminate combinations
- many other processes accessible upon request
Precursors
- Liquid, solid, gas, ozone, plasma(*)
- Up to 12 sources with 7 separate inlets
R200 in the cleanroom (drybox-integrated COVAP in the backround)