We work in the field of atomic layer deposition (ALD), with key interests in the development of new ligands and precursor compounds.

We study deposition processes from a mechanistic point of view and hope to bring fundamental chemical interpretation to gas and surface phase reactivity.

Key Words

Main Group Synthesis
Transition Metal Synthesis
Ligand Design
Precursor Design
Work-Life Balance
Thermal Characterization
Chemical Vapour Deposition (CVD)
Atomic Layer Deposition (ALD)

We are actively looking for interesting and cool graduate students and fourth-year Honours students.

We welcome everybody, except for those who do not welcome everybody.