We work in the field of atomic layer deposition (ALD), with key interests in the development of new ligands and precursor compounds.
We study deposition processes from a mechanistic point of view and hope to bring fundamental chemical interpretation to gas and surface phase reactivity.
Main Group Synthesis
Transition Metal Synthesis
Chemical Vapour Deposition (CVD)
Atomic Layer Deposition (ALD)
We are actively looking for interesting and cool graduate students and fourth-year Honours students.
We welcome everybody, except for those who do not welcome everybody.