Facility Layout

The MFL has a total clean room floor area of approximately 300 m2. It contains four distinct working areas, for photolithography, photomask preparation, furnace operations, and high vacuum processes, each separated by a service bay. A separate air conditioning system maintains the facility temperature at 20°C with 40% relative humidity throughout the year. Class 100 air quality is maintained in the photolithography and photomask production areas (approximately 80 m2 total), Class 10,000 in the oxidation/diffusion area, and Class 100 in the vacuum system area. Laminar flow load hoods and wet benches are used to provide local zones of higher air quality in the ox/diff area.